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RTD-Wafer Temperatur...

TC-Wafer Temperature...

In-situ High Temp Sy...

Mask Wireless Temp ...

RTD-Wafer Temperature Measurement System/ RTD-Wafer,Temperature,,Measurement,System

RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature measurement and supports processes such as photoresist tracking systems and wafer detectors. The system directly measures wafer temperature stability and uniformity without relying on contact temperature sensors. With this system, lithography engineers can measure and fine-tune the photoresist baking temperature uniformity to ensure that the advanced lithography process meets the temperature accuracy required to achieve high yields.

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TC-Wafer Temperature Measuring System/ TC-Wafer,Temperature,,Measuring,System

The TC-Wafer Temperature Measuring System is designed to collect temperature data from the environment of process equipment. The system comprises the TC-Wafer unit and computer testing software. It features channels ranging from 1 to 34, capable of measuring a broad spectrum of temperatures. The system ensures real-time transmission of collected data, communicating with the computer via wired modes such as RS485, USB, or Ethernet. It also includes functions for data collection, storage, analysis, curve drawing, and cloud mapping.

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In-situ High Temp System/ In-situ,High,Temp,System

In-situ High Temp System is designed to optimize and monitor advanced film processes (FEOL and BEOL ALD, CVD and PVD) and other elevated temperature processes. In-situ High Temp System wafer measures process tool thermal uniformity, providing a complete picture of temporal and spatial temperature data collected in real-time under actual production process conditions. By revealing thermal variations in applications such as plasma environments that can affect process windows andpatterning performance, the system helps IC manufacturers optimize the integration of new materials,transistor technologies and complex patterning techniques.

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Mask Wireless Temp System/ Mask,Wireless,Temp,System

Mask Wireless Temp System is used for qualification and monitoring of e-beam writers as extreme temperature stability is required over the extended time period (up to 24 hours) to completely write a mask.Mask Wireless Temp System collects temperature data for 24 consecutive hours, providing mask manufacturers with the data needed to ensure the thermal stability of the system prior to writing critical masks.

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