RTD-Wafer Temperature Measurement System
RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature measurement and supports processes such as photoresist tracking systems and wafer detectors. The system directly measures wafer temperature stability and uniformity without relying on contact temperature sensors. With this system, lithography engineers can measure and fine-tune the photoresist baking temperature uniformity to ensure that the advanced lithography process meets the temperature accuracy required to achieve high yields.
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Hu ICP Bei No. 2023002235
