Mask Wireless Temperature Measurement System - Semiconductor - Industry&Field

Semiconductor

Mask Wireless Temperature Measurement System

Photomask is a pattern master used in photolithography technique in microelectronics manufacturing. Mask patterns are formed on transparent bases by opaque light-shielding films, and the patterns are transferred to product bases through exposure. During semiconductor chip manufacturing, there are high requirements on the temperature uniformity of photomask surface, requiring for strict temperature measurement and control. Wireless mask temperature measurement system is used to accurately measure the temperature distribution of photomask.

Basic Introduction

Parameters

Mask Wireless Temperature Measurement System

Overview

Features

a.Small size, high accuracy, high measurement speed;

b.Temperature accuracy up to 10mK;

c.Wireless communication, short response time, high measurement frequency, continuous working time of more than 100 minutes.

Parameters

Temperature range	0℃～30℃
Temperature accuracy	1mK（3σ）
Accuracy of repeated measurement	＜2mK（3σ）
Number of sensors	14
Sampling frequency	max.4Hz
Sensor response time	≤1s
Communication interface	WiFi
Continuous working hours	≥100min
Warranty period	1 year

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