In-situ High Temp System
In-situ High Temp System is designed to optimize and monitor advanced film processes (FEOL and BEOL ALD, CVD and PVD) and other elevated temperature processes. In-situ High Temp System wafer measures process tool thermal uniformity, providing a complete picture of temporal and spatial
temperature data collected in real-time under actual production process conditions. By revealing thermal variations in applications such as plasma environments that can affect process windows andpatterning performance, the system helps IC manufacturers optimize the integration of new materials,transistor technologies and complex patterning techniques.
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Hu ICP Bei No. 2023002235
