In-situ Scanner Temp System
In-situ Scanner Temp System supports monitoring of dry, immersion and EUV lithography scanners. In-situ Scanner Temp System produces high accuracy temporal and spatial wafer temperature data that can assist lithography engineers monitor scanner thermal variations that affect pattern overlay performance. With a standard-thickness(12 inches) wafer format, this system can be used to monitor lithography thermal uniformity and stability with high precision and low noise, enabling scanner qualification and matching.
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Hu ICP Bei No. 2023002235
