Mask Wireless Temperature Measurement System - Semiconductor - Industry&Field

Semiconductor

Mask Wireless Temperature Measurement System

The photolithography system is the core of chip manufacturing, and temperature detection is particularly important, because temperature will affect the flow of photoresist, thereby affecting the yield of photolithography. Micro wireless temperature recorder is small in size, light in weight, and easy to carry. It is suitable for temperature detection and recording of exposure systems, photolithography systems, etc.

Basic Introduction

Parameters

Mask Wireless Temperature Measurement System

Overview

A mask, also known as a reticle, is a graphic master used in the photolithography in microelectronics manufacturing. It forms a mask pattern on a transparent substrate by an opaque light-shielding film, and transfers the pattern to the substrate by exposure. The processing and manufacturing process of semiconductor chips has very high requirements on the temperature uniformity of the surface of the photomask, which requires strict temperature measurement and control. Mask wireless temperature measurement system is used to accurately measure the temperature distribution of photomasks.

Features

a. Small size, high accuracy, high measurement speed;

b. Temperature accuracy up to 10mK;

c. Wireless communication, short response time, high measurement frequency, continuous working time of more than 100 minutes.

Parameters

Dimensions	Customized according to user requirements
Temperature Range	0 ~ 30℃
Temperature Accuracy	1mK
Repeated Measurements Precision	＜5mK（3σ）
Sensor Response Time	≤1s
Measurement Frequency	max.1Hz
Continuous Working Time	≥100min
Number of sensors	≥62 factory settings, ≥60 during the warranty period
Warranty Period	1 year

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