On 8 January 2026, the AI-Empowered · Intelligent Future Symposium on Smart Sensing and Test Measurement Technology was successfully held at the Shanghai Smart Sensor Industrial Park. Organised by Keysight Technologies with guidance from the China Sensor and IoT Industry Alliance and Silicon Intelligence Technology, and held with the strong support of the industrial park, the event brought together industry and technical experts for in-depth discussions on sensor development trends and testing and verification technologies spanning materials, devices, and system-level applications.
The Path to Domestic mK-Class Semiconductor Thermal Management
At this grand gathering themed around ‘AI Empowerment’, JHEAT was invited to deliver a keynote address. Centred on ‘AI-Driven Thermal Management Technology: A Pathway to Breakthroughs in Semiconductor Domestication’, the presentation addressed the industry's challenges in temperature calibration technology. It outlined core AI solutions and showcased the research and application achievements of mK-grade constant-temperature equipment for semiconductor wafer calibration. The presentation garnered significant attention and recognition from attending experts and industry peers.
The Path to Breaking Through with Domestic mK-Grade Semiconductors
The high-quality development of the semiconductor industry hinges upon ultra-high-precision temperature measurement and calibration technologies. JHEAT's thermostatic bath for wafer calibration, specifically designed to address this critical need, stands as the core solution to industry challenges. Centred on AI technology, this product establishes six breakthrough pathways that comprehensively overcome domestic technical bottlenecks:
1. Large-aperture multi-wafer calibration design enhances industrial efficiency
Working area net dimensions: 450 × 360 × 450 mm, with a volume capacity of up to 100 litres.
2. Ultra-high stability achieving internationally leading standards
Temperature stability across the full range of 5°C to 50°C exceeds ±1 mK (±0.001°C).
3. Exceptional uniformity enhancement for guaranteed calibration accuracy
Unlike conventional stirring methods, our self-priming agitation aligns with the wafer diameter, achieving faster, more uniform mixing with ±2mK (±0.002℃) uniformity.
4. AI-driven PID parameter tuning, redefining temperature control logic
Employs GRU (Gated Recurrent Unit) algorithms to replace conventional PID parameter tuning methods.
5. AI-powered measurement and control R&D pathway, establishing core technological barriers
AI adaptive PID parameter tuning; AI-enhanced control algorithms; multi-agent collaborative control.
6. Optimised data display, enhancing operational experience
Display: Target/current temperature; stability monitoring; temperature curves; operational controls.
Looking Ahead
AI technology is reshaping the development landscape of the intelligent sensing and semiconductor industries. As a critical link in the industrial chain, the domestic substitution of thermal management solutions is imperative. Moving forward, JHEAT will continue to deepen its expertise in ultra-high-precision temperature measurement and thermal management technologies. With AI as the core driving force, we will continuously refine our product portfolio and solutions while actively integrating into the ecosystem development of the intelligent sensing and semiconductor industries. Through domestically produced products offering enhanced reliability and greater autonomy, we will facilitate breakthroughs in critical industrial chain segments, thereby empowering the high-quality development of China's advanced manufacturing and intelligent sensing sectors.
Hu ICP Bei No. 2023002235
