Wafer High-temp Wireless Temperature Measurement System - Semiconductor - Industry&Field

Semiconductor

Wafer High-temp Wireless Temperature Measurement System

Wafer high-temp wireless temperature measurement system are designed to optimize and monitor advanced thin film processes (FEOL and BEOLALD, CVD and PVD), RTP rapid annealing, and other high temperature processes.Wafer high-temp wireless Temperature measurement systems measure the thermal uniformity of process equipment and provide temporal and spatial temperature data collected under real-world production process conditions.Wafer high-temp wireless temperature measurement systems provide in-situ, real-time temperature data to help IC manufacturers accurately debug process equipment to improve yields and productivity

Basic Introduction

Parameters

Wafer High-temp Wireless Temperature Measurement System

Overview

Features

a.High accuracy, flexible application, fast measurement;

b.Scanning speed up to 4Hz, temperature accuracy up to ±0.2℃ ;

c.Wireless communication.

Dimensions	Wafer diameter 300mm (12 inches) ±0.2mm, thickness ≤6mm
Power supply	Battery
Temperature measurement range	0℃～850℃
Temperature accuracy	±0.2℃
Accuracy of repeated measurement	＜0.1℃
Number of sensors	21
Measurement Frequency	max.4Hz
Sensor Response Time	≤1s
communication interface	WiFi
Continuous Working Time	0℃～850℃，7minutes 0℃～650℃，15minutes
Base materia	Si
Warranty Period	1year

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